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Interferometry is a key technology in the qualification of various optical components and systems. Many of its applications at ZEISS, such as in EUV lithography, require extremely high levels of accuracy, making a detailed characterization of the used measurement device indispensable. A major source of error are wavefront perturbations due to diffraction at microscopic surface defects. This master's thesis focuses on the impact of such local surface defects on the interferogram and the investigation of resulting measurement errors through simulations. This will include a quantitative comparison of different simulation methods, such as Fourier-based propagation or ray-based approaches, aiming to provide an optimal choice guideline, depending on specific circumstances. This collaboration project with ZEISS in Oberkochen, provides an insight in a highly dynamic R&D environment with many exciting research fields.

• you are enrolled in a Master's program of physics, optics or comparable

• you have basic knowledge in optics

• you have basic programming skills in python

• you have excellent organization, problem-solving, communication and innovation skills

• you are fluent in English or German